Escáner de litografía EUV
TWINSCAN EXE:5000
Intel and ASML reported that more than one million wafers have been processed using High-NA EUV lithography. The total combines testing, research, and production on selected layers: it is an industrial learning milestone, not a direct measure of yield, cost, or commercial volume.
- Brand
- ASML
- Model
- EXE:5000
- Generation
- High-NA EUV, apertura numérica 0,55
- Status
- Available
Exact identification
Variants
| Variant | MPN / SKU | Market | Configuration |
|---|---|---|---|
| TWINSCAN EXE:5000 | EXE:5000 | — | Apertura numérica: 0,55 |
Documented data
Specifications
- Apertura numérica
- 0,55
- Resolución
- 8 nm
Connections
Technologies and standards
- technologyLitografía ultravioleta extrema de alta apertura numérica (High-NA EUV)
Editorial context